OBJECTIVE 物鏡

OBJECTIVE 物鏡 

 

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物鏡
 
UIS OBJECTIVES
Universal Infinity System

UIS Optical characteristics of objectives for industrial and metallurgical applications.
UMPLFL(-BD) Plan Semi-Apochromat Series
The universal Plan Semi-Apochromat objectives completely eliminate coma aberration, providing perfect for a wide range of microscopic methods including brightfield (darkfield), fluorescence, Nomarski DIC and simple polarized light observations.
UMPLFL-BDP Plan Semi-Apochromat POL Series
The Plan Fluorite Semi-Apochromat POL design ensures thorough compensation for coma aberration, Distortion is also minimized, thereby making these objectives the best choice for Nomarski DIC and real polarized light microscopy.
 
LMPLAPO (-BD) Plan Apochromat Series
Exhibiting outstanding resolving power at super high magnifications. Ideal for observation of high-density IC wafers and other samples with minute details at long working distance.
LMPLFL (-BD) Plan Semi-Apochromat Series
These Plan Semi-Apochromat objectives feature a long working distance which makes it easy to change samples without touching the coarse focus.

 
MPL (-BD) Plan Achromat Series
Designed for brightfield (or brightfield/darkfield) observation, these Plan Achromat objectives ensure superb filed flatness up to F.N. 22.
 

鼎晶科技/Tomas ATG/TTG百輝/溫澤 BRILLANT 3D製造商(德國授權) (昆山 /東莞 立偉國際 )

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Micr

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